Tailoring Al-SiO2 interfacial work function using an organophosphonate nanolayer

Matthew Kwan, Roy Winter, P. Hubert Mutin, Moshe Eizenberg, Ganpati Ramanath*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

We show that introducing a mercaptan-terminated organophosphonate nanomolecular layer (NML) at the Al-SiO2 interface decreases the effective metal work function Φeff by 0.67 eV. In contrast, introducing a methyl-terminated organophosphonate NML has a negligible impact on Φeff. Photoelectron spectroscopy of NML-tailored surfaces and Al-NML-SiO2 interfaces indicate that Al bonds with oxidized mercaptan moieties form Al-O-S bridges, which determine the Φeff shift. Our findings should be useful for molecularly tailoring the electronic properties of metal-ceramic interfaces for electronics and energy device applications.

Original languageEnglish
Article number121602
JournalApplied Physics Letters
Volume111
Issue number12
DOIs
StatePublished - 18 Sep 2017
Externally publishedYes

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