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Chemical vapor deposition of TiN for ULSI applications
M. Eizenberg
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Corresponding author for this work
Research output
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Contribution to journal
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Conference article
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peer-review
19
Scopus citations
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Dive into the research topics of 'Chemical vapor deposition of TiN for ULSI applications'. Together they form a unique fingerprint.
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Engineering & Materials Science
Air
23%
Aspect ratio
39%
Chemical vapor deposition
100%
Nitrogen
39%
Plasma deposition
71%
Plasmas
39%
Pyrolysis
81%
Sputtering
54%
Topography
48%
Chemical Compounds
Application
27%
Chemical Vapour Deposition
77%
Deposition Technique
46%
Liquid Film
20%
Plasma
53%
Pyrolysis
59%
Reduction
39%
Resistance
27%
Sputtering
46%
Physics & Astronomy
air
17%
aspect ratio
25%
electrical resistivity
36%
nitrogen
20%
sputtering
22%
thermal decomposition
63%
topography
26%
vapor deposition
65%