Skip to main navigation
Skip to search
Skip to main content
Guangdong Technion - Israel Institute of Technology Home
Help & FAQ
Home
Profiles
Research units
Research output
Search by expertise, name or affiliation
Chemical vapor deposition of TiN for ULSI applications
M. Eizenberg
*
*
Corresponding author for this work
Research output
:
Contribution to journal
›
Conference article
›
peer-review
19
Scopus citations
Overview
Fingerprint
Fingerprint
Dive into the research topics of 'Chemical vapor deposition of TiN for ULSI applications'. Together they form a unique fingerprint.
Sort by
Weight
Alphabetically
Engineering & Materials Science
Chemical vapor deposition
100%
Pyrolysis
81%
Plasma deposition
71%
Sputtering
54%
Topography
48%
Nitrogen
39%
Aspect ratio
39%
Plasmas
39%
Air
23%
Chemical Compounds
Chemical Vapour Deposition
77%
Pyrolysis
59%
Plasma
53%
Deposition Technique
46%
Sputtering
46%
Reduction
39%
Resistance
27%
Application
27%
Liquid Film
20%
Physics & Astronomy
vapor deposition
65%
thermal decomposition
63%
electrical resistivity
36%
topography
26%
aspect ratio
25%
sputtering
22%
nitrogen
20%
air
17%