Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition

Engineering & Materials Science

• Atomic layer deposition 100%
• Titanium nitride 93%
• Plasmas 60%
• Gases 37%
• Contamination 15%
• Nitrogen 15%
• Oxygen 13%
• Carbon 12%
• Crystal microstructure 10%
• Titanium 7%
• Thin films 7%
• Degradation 5%

Chemical Compounds

• Atomic Layer Epitaxy 75%
• Nitride 63%
• Plasma 40%
• Gas 34%
• Liquid Film 31%
• Dioxygen 7%
• Carbon Atom 7%
• Grain Size 7%
• Dielectric Material 7%
• Nitrogen 4%
• Chemistry 4%

Physics & Astronomy

• titanium nitrides 79%
• atomic layer epitaxy 67%
• gases 33%
• contamination 16%
• nitrogen 13%
• plasma chemistry 12%
• carbon 12%
• oxygen 11%
• titanium 7%
• degradation 7%
• grain size 6%
• electrical resistivity 5%
• thin films 4%