Structures of ultra-thin atomic-layer-deposited TaNx films

Y. Y. Wu*, A. Kohn, M. Eizenberg

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

64 Scopus citations

Abstract

The structure and stability of ultra-thin TaNxfilms deposited using atomic layer deposition (ALD) technique, were investigated. The Auger electron spectroscopy (AES), x-ray photoelectron spectroscopy (XPS), x-ray diffraction (XRD) and transmission electron microscopy (TEM) techniques were used for the study of the deposited films. The TaNx ultra-thin films were found to be nanocrystalline with an fcc NaCl-structure. It was also observed that Ta atoms in the films were strongly bonded with their surrounding N atoms in an ionic type.

Original languageEnglish
Pages (from-to)6167-6174
Number of pages8
JournalJournal of Applied Physics
Volume95
Issue number11 I
DOIs
StatePublished - 1 Jun 2004
Externally publishedYes

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