Structure of electroless deposited Co0.9W0.02P 0.08 thin films and their evolution with thermal annealing

A. Kohn*, M. Eizenberg, Y. Shacham-Diamand

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

28 Scopus citations

Abstract

The structure of electroless deposited Co0.9W 0.02P0.08 thin films and their evolution with thermal annealing were presented. It was shown that as-deposited microstructure was comprised of an amorphous CoWP component and nanocrystallites of hexagonal-close-packed (hcp) Co, approximately 5 nm in size. The isothermal anneals showed that the rate of nucleation with time of the hcp Co grains was constant.

Original languageEnglish
Pages (from-to)3810-3822
Number of pages13
JournalJournal of Applied Physics
Volume94
Issue number6
DOIs
StatePublished - 15 Sep 2003
Externally publishedYes

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