Skip to main navigation
Skip to search
Skip to main content
Guangdong Technion - Israel Institute of Technology Home
Help & FAQ
Home
Profiles
Research units
Research output
Search by expertise, name or affiliation
Chemical vapor deposited RuO
x
films: Interfacial adhesion study
P. Gopal Ganesan,
M. Eizenberg
*
*
Corresponding author for this work
Research output
:
Contribution to journal
›
Article
›
peer-review
7
Scopus citations
Overview
Fingerprint
Fingerprint
Dive into the research topics of 'Chemical vapor deposited RuO
x
films: Interfacial adhesion study'. Together they form a unique fingerprint.
Sort by
Weight
Alphabetically
Engineering & Materials Science
Adhesion
100%
Chemical vapor deposition
63%
Flow rate
10%
Hot Temperature
6%
Impurities
13%
Oxides
11%
Oxygen
54%
Peeling
17%
Rapid thermal annealing
62%
Ruthenium
20%
Seed
42%
Sputtering
17%
Substrates
9%
Tensile stress
13%
Vapors
97%
Physics & Astronomy
adhesion
91%
annealing
24%
flow velocity
10%
impurities
8%
oxides
8%
oxygen
41%
peeling
17%
ruthenium
16%
seeds
37%
sputtering
10%
tensile stress
13%
vapor deposition
41%
vapors
82%
Chemical Compounds
Chemical Vapour Deposition
24%
Diffusion
8%
Dioxygen
33%
Flow
26%
Flow Kinetics
10%
Force
9%
Liquid Film
52%
Oxide
7%
Rapid Thermal Annealing
60%
Sputtering
14%
Work of Adhesion
19%