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Atomic layer deposition of tungsten film from WF6/B2H6: Nucleation layer for advanced semiconductor devices
Michael Yang*, Hua Chung, Alex Yoon, Hongbin Fang, Amy Zhang, Cheryl Knepfler, Robert Jackson, Jeong Soo Byun, Alfred Mak, Moshe Eizenberg, Ming Xi, Moris Kori, A. K. Sinha
*Corresponding author for this work
Research output: Contribution to journal › Conference article › peer-review
10
Scopus
citations