We demonstrate the use of UV-exposed molecular nanolayers (MNLs) of 3-mercaptan-propyl-trimethoxysilane to inhibit copper-transport across Cu-Si O2 interfaces more efficiently than the pristine MNLs. Bias-thermal-annealing tests of CuMNLSi O2 Si (001) Al capacitors, with MNLs exposed to 254 nm UV radiation, exhibit enhanced barrier properties to Cu diffusion, when compared with capacitors with MNLs not exposed to UV light. X-ray photoelectron spectroscopy reveals that UV exposure converts the mercaptan termini to sulfonates, which are more effective in inhibiting Cu diffusion. Our findings are of importance for tailoring the chemical and mechanical integrity of interfaces for use in applications such as nanodevice wiring and molecular electronics.
|Journal||Applied Physics Letters|
|State||Published - 2007|