The role of metal/high-k dielectric interfaces in advanced gate stacks

^*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Original language	English
Title of host publication	Advanced Metallization Conference 2010
Pages	134-135
Number of pages	2
State	Published - 2010
Externally published	Yes
Event	Advanced Metallization Conference 2010 - Albany, NY, United States Duration: 5 Oct 2010 → 7 Oct 2010

Name	Advanced Metallization Conference (AMC)
ISSN (Print)	1540-1766

Conference	Advanced Metallization Conference 2010
Country/Territory	United States
City	Albany, NY
Period	5/10/10 → 7/10/10

Cite this

@inproceedings{87b0b8eeaace4b5eb9e9db6f46250235,

title = "The role of metal/high-k dielectric interfaces in advanced gate stacks",

author = "M. Eizenberg",

year = "2010",

language = "英语",

isbn = "9781617822810",

series = "Advanced Metallization Conference (AMC)",

pages = "134--135",

booktitle = "Advanced Metallization Conference 2010",

note = "Advanced Metallization Conference 2010 ; Conference date: 05-10-2010 Through 07-10-2010",

}

TY - GEN

T1 - The role of metal/high-k dielectric interfaces in advanced gate stacks

AU - Eizenberg, M.

PY - 2010

Y1 - 2010

UR - http://www.scopus.com/inward/record.url?scp=79957631039&partnerID=8YFLogxK

M3 - 会议稿件

AN - SCOPUS:79957631039

SN - 9781617822810

T3 - Advanced Metallization Conference (AMC)

SP - 134

EP - 135

BT - Advanced Metallization Conference 2010

T2 - Advanced Metallization Conference 2010

Y2 - 5 October 2010 through 7 October 2010

ER -