Surface morphology for ion-beam sputtered Al layer with varying sputtering conditions

Amitesh Paul; Jorg Wingbermühle

doi:10.1016/j.apsusc.2005.10.056

Surface morphology for ion-beam sputtered Al layer with varying sputtering conditions

Amitesh Paul^*, Jorg Wingbermühle

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

22 Scopus citations

Abstract

We study the growth morphology of thin macrostructure films which is known to be largely affected by the deposition conditions as thin film nucleation and formation is dependent on the kinetic energy and chemical free energy of the atoms. The ion-beam sputtering technique used for depositing thin layers is due to the advantage over other techniques, e.g. the independent control of many process parameters, such as the pressure and/or the energy of the ion-beam and the substrate temperature. Therefore, the dependence of various sputtering parameters such as: (i) sputtering pressure and/or the rate of deposition and (ii) the effect of substrate temperature on the growth has been studied by depositing a single layer of Al. The variations show some interesting dependencies on the structural parameters for the Al layer deposited which has been understood in terms of thin film growth and nucleation theory.

Original language	English
Pages (from-to)	8151-8155
Number of pages	5
Journal	Applied Surface Science
Volume	252
Issue number	23
DOIs	https://doi.org/10.1016/j.apsusc.2005.10.056
State	Published - 30 Sep 2006
Externally published	Yes

Keywords

Surface structure and topography

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10.1016/j.apsusc.2005.10.056

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title = "Surface morphology for ion-beam sputtered Al layer with varying sputtering conditions",

abstract = "We study the growth morphology of thin macrostructure films which is known to be largely affected by the deposition conditions as thin film nucleation and formation is dependent on the kinetic energy and chemical free energy of the atoms. The ion-beam sputtering technique used for depositing thin layers is due to the advantage over other techniques, e.g. the independent control of many process parameters, such as the pressure and/or the energy of the ion-beam and the substrate temperature. Therefore, the dependence of various sputtering parameters such as: (i) sputtering pressure and/or the rate of deposition and (ii) the effect of substrate temperature on the growth has been studied by depositing a single layer of Al. The variations show some interesting dependencies on the structural parameters for the Al layer deposited which has been understood in terms of thin film growth and nucleation theory.",

keywords = "Surface structure and topography",

author = "Amitesh Paul and Jorg Wingberm{\"u}hle",

note = "Funding Information: We thank D.E. B{\"u}rgler for useful discussions. This work is supported by the HGF-Strategiefondsproject “Magnetoelectronics”.",

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doi = "10.1016/j.apsusc.2005.10.056",

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T1 - Surface morphology for ion-beam sputtered Al layer with varying sputtering conditions

AU - Paul, Amitesh

AU - Wingbermühle, Jorg

N1 - Funding Information: We thank D.E. Bürgler for useful discussions. This work is supported by the HGF-Strategiefondsproject “Magnetoelectronics”.

PY - 2006/9/30

Y1 - 2006/9/30

N2 - We study the growth morphology of thin macrostructure films which is known to be largely affected by the deposition conditions as thin film nucleation and formation is dependent on the kinetic energy and chemical free energy of the atoms. The ion-beam sputtering technique used for depositing thin layers is due to the advantage over other techniques, e.g. the independent control of many process parameters, such as the pressure and/or the energy of the ion-beam and the substrate temperature. Therefore, the dependence of various sputtering parameters such as: (i) sputtering pressure and/or the rate of deposition and (ii) the effect of substrate temperature on the growth has been studied by depositing a single layer of Al. The variations show some interesting dependencies on the structural parameters for the Al layer deposited which has been understood in terms of thin film growth and nucleation theory.

AB - We study the growth morphology of thin macrostructure films which is known to be largely affected by the deposition conditions as thin film nucleation and formation is dependent on the kinetic energy and chemical free energy of the atoms. The ion-beam sputtering technique used for depositing thin layers is due to the advantage over other techniques, e.g. the independent control of many process parameters, such as the pressure and/or the energy of the ion-beam and the substrate temperature. Therefore, the dependence of various sputtering parameters such as: (i) sputtering pressure and/or the rate of deposition and (ii) the effect of substrate temperature on the growth has been studied by depositing a single layer of Al. The variations show some interesting dependencies on the structural parameters for the Al layer deposited which has been understood in terms of thin film growth and nucleation theory.

KW - Surface structure and topography

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U2 - 10.1016/j.apsusc.2005.10.056

DO - 10.1016/j.apsusc.2005.10.056

M3 - 文章

AN - SCOPUS:33748168719

SN - 0169-4332

VL - 252

SP - 8151

EP - 8155

JO - Applied Surface Science

JF - Applied Surface Science

IS - 23

ER -

Surface morphology for ion-beam sputtered Al layer with varying sputtering conditions

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Keywords

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