Structures of ultra-thin atomic-layer-deposited TaNx films

Y. Y. Wu; A. Kohn; M. Eizenberg

doi:10.1063/1.1711176

Structures of ultra-thin atomic-layer-deposited TaN_x films

Y. Y. Wu^*, A. Kohn, M. Eizenberg

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

68 Scopus citations

Abstract

The structure and stability of ultra-thin TaN_xfilms deposited using atomic layer deposition (ALD) technique, were investigated. The Auger electron spectroscopy (AES), x-ray photoelectron spectroscopy (XPS), x-ray diffraction (XRD) and transmission electron microscopy (TEM) techniques were used for the study of the deposited films. The TaN_x ultra-thin films were found to be nanocrystalline with an fcc NaCl-structure. It was also observed that Ta atoms in the films were strongly bonded with their surrounding N atoms in an ionic type.

Original language	English
Pages (from-to)	6167-6174
Number of pages	8
Journal	Journal of Applied Physics
Volume	95
Issue number	11 I
DOIs	https://doi.org/10.1063/1.1711176
State	Published - 1 Jun 2004
Externally published	Yes

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abstract = "The structure and stability of ultra-thin TaNxfilms deposited using atomic layer deposition (ALD) technique, were investigated. The Auger electron spectroscopy (AES), x-ray photoelectron spectroscopy (XPS), x-ray diffraction (XRD) and transmission electron microscopy (TEM) techniques were used for the study of the deposited films. The TaNx ultra-thin films were found to be nanocrystalline with an fcc NaCl-structure. It was also observed that Ta atoms in the films were strongly bonded with their surrounding N atoms in an ionic type.",

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N2 - The structure and stability of ultra-thin TaNxfilms deposited using atomic layer deposition (ALD) technique, were investigated. The Auger electron spectroscopy (AES), x-ray photoelectron spectroscopy (XPS), x-ray diffraction (XRD) and transmission electron microscopy (TEM) techniques were used for the study of the deposited films. The TaNx ultra-thin films were found to be nanocrystalline with an fcc NaCl-structure. It was also observed that Ta atoms in the films were strongly bonded with their surrounding N atoms in an ionic type.

AB - The structure and stability of ultra-thin TaNxfilms deposited using atomic layer deposition (ALD) technique, were investigated. The Auger electron spectroscopy (AES), x-ray photoelectron spectroscopy (XPS), x-ray diffraction (XRD) and transmission electron microscopy (TEM) techniques were used for the study of the deposited films. The TaNx ultra-thin films were found to be nanocrystalline with an fcc NaCl-structure. It was also observed that Ta atoms in the films were strongly bonded with their surrounding N atoms in an ionic type.

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Structures of ultra-thin atomic-layer-deposited TaN_x films

Abstract

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