Stress in Si1-xGex films prepared by ion sputtering: origin and relaxation

Y. Le Meur*, F. Meyer, C. Pellet, C. Schwebel, P. Möller, A. Buxbaum, A. Raizman, M. Eizenberg

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

3 Scopus citations

Fingerprint

Dive into the research topics of 'Stress in Si1-xGex films prepared by ion sputtering: origin and relaxation'. Together they form a unique fingerprint.

Engineering & Materials Science

Chemical Compounds

Physics & Astronomy