Intrinsic electron traps in atomic-layer deposited HfO2 insulators

F. Cerbu, O. Madia, D. V. Andreev, S. Fadida, M. Eizenberg, L. Breuil, J. G. Lisoni, J. A. Kittl, J. Strand, A. L. Shluger, V. V. Afanas'Ev, M. Houssa, A. Stesmans

Research output: Contribution to journal › Article › peer-review

43 Scopus citations

Fingerprint

Dive into the research topics of 'Intrinsic electron traps in atomic-layer deposited HfO2 insulators'. Together they form a unique fingerprint.

Physics & Astronomy