Formation of barrier-type anodic films on sputtering-deposited Al-Ti alloys

V. C. Nettikaden; A. Baron-Wiecheć; P. Bailey; T. C.Q. Noakes; P. Skeldon; G. E. Thompson

doi:10.1016/j.corsci.2010.07.022

Formation of barrier-type anodic films on sputtering-deposited Al-Ti alloys

V. C. Nettikaden, A. Baron-Wiecheć, P. Bailey, T. C.Q. Noakes, P. Skeldon^*, G. E. Thompson

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

11 Scopus citations

Abstract

The formation of amorphous anodic films at constant current is investigated for sputtering-deposited Al-Ti alloys containing from 3-30at.% Ti. The films were grown at high efficiency in a borate electrolyte and comprised a main region containing units of Al₂O₃ and TiO₂, with a thin surface region enriched in titanium species. The formation ratios of the films increased with increase of titanium content of the alloys. The presence of the outer region is explained by the faster migration of Ti⁴⁺ ions relative to that of Al³⁺ ions through the films.

Original language	English
Pages (from-to)	3717-3724
Number of pages	8
Journal	Corrosion Science
Volume	52
Issue number	11
DOIs	https://doi.org/10.1016/j.corsci.2010.07.022
State	Published - Nov 2010
Externally published	Yes

Keywords

A. Titanium
A: Aluminium
B. RBS
B: TEM
C: Anodic films

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10.1016/j.corsci.2010.07.022

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@article{bff6650a208e40e6b6e7ec01985bae9d,

title = "Formation of barrier-type anodic films on sputtering-deposited Al-Ti alloys",

abstract = "The formation of amorphous anodic films at constant current is investigated for sputtering-deposited Al-Ti alloys containing from 3-30at.% Ti. The films were grown at high efficiency in a borate electrolyte and comprised a main region containing units of Al2O3 and TiO2, with a thin surface region enriched in titanium species. The formation ratios of the films increased with increase of titanium content of the alloys. The presence of the outer region is explained by the faster migration of Ti4+ ions relative to that of Al3+ ions through the films.",

keywords = "A. Titanium, A: Aluminium, B. RBS, B: TEM, C: Anodic films",

author = "Nettikaden, {V. C.} and A. Baron-Wieche{\'c} and P. Bailey and Noakes, {T. C.Q.} and P. Skeldon and Thompson, {G. E.}",

note = "Funding Information: The authors are grateful to Dr I. Vickridge and Dr E. Briand of SAFIR, Institut des Nano Sciences de Paris, Universit{\'e}s de Paris 6 Pierre et Marie Curie, and Paris 7 Denis Diderot, for assistance with ion beam analyses. They also wish to thank the Engineering and Physical Sciences Research Council for financial support (Portfolio Award; LATEST).",

year = "2010",

month = nov,

doi = "10.1016/j.corsci.2010.07.022",

language = "英语",

volume = "52",

pages = "3717--3724",

journal = "Corrosion Science",

issn = "0010-938X",

publisher = "Elsevier Ltd.",

number = "11",

}

TY - JOUR

T1 - Formation of barrier-type anodic films on sputtering-deposited Al-Ti alloys

AU - Nettikaden, V. C.

AU - Baron-Wiecheć, A.

AU - Bailey, P.

AU - Noakes, T. C.Q.

AU - Skeldon, P.

AU - Thompson, G. E.

N1 - Funding Information: The authors are grateful to Dr I. Vickridge and Dr E. Briand of SAFIR, Institut des Nano Sciences de Paris, Universités de Paris 6 Pierre et Marie Curie, and Paris 7 Denis Diderot, for assistance with ion beam analyses. They also wish to thank the Engineering and Physical Sciences Research Council for financial support (Portfolio Award; LATEST).

PY - 2010/11

Y1 - 2010/11

N2 - The formation of amorphous anodic films at constant current is investigated for sputtering-deposited Al-Ti alloys containing from 3-30at.% Ti. The films were grown at high efficiency in a borate electrolyte and comprised a main region containing units of Al2O3 and TiO2, with a thin surface region enriched in titanium species. The formation ratios of the films increased with increase of titanium content of the alloys. The presence of the outer region is explained by the faster migration of Ti4+ ions relative to that of Al3+ ions through the films.

AB - The formation of amorphous anodic films at constant current is investigated for sputtering-deposited Al-Ti alloys containing from 3-30at.% Ti. The films were grown at high efficiency in a borate electrolyte and comprised a main region containing units of Al2O3 and TiO2, with a thin surface region enriched in titanium species. The formation ratios of the films increased with increase of titanium content of the alloys. The presence of the outer region is explained by the faster migration of Ti4+ ions relative to that of Al3+ ions through the films.

KW - A. Titanium

KW - A: Aluminium

KW - B. RBS

KW - B: TEM

KW - C: Anodic films

UR - http://www.scopus.com/inward/record.url?scp=77956263428&partnerID=8YFLogxK

U2 - 10.1016/j.corsci.2010.07.022

DO - 10.1016/j.corsci.2010.07.022

M3 - 文章

AN - SCOPUS:77956263428

SN - 0010-938X

VL - 52

SP - 3717

EP - 3724

JO - Corrosion Science

JF - Corrosion Science

IS - 11

ER -

Formation of barrier-type anodic films on sputtering-deposited Al-Ti alloys

Abstract

Keywords

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