Degradation of ultra-thin boron films in air

L. B. Bayu Aji; A. A. Baker; J. H. Bae; A. M. Hiszpanski; E. Stavrou; S. K. McCall; S. O. Kucheyev

doi:10.1016/j.apsusc.2018.04.126

Degradation of ultra-thin boron films in air

L. B. Bayu Aji^*, A. A. Baker, J. H. Bae, A. M. Hiszpanski, E. Stavrou, S. K. McCall, S. O. Kucheyev

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

7 Scopus citations

Abstract

Corrosion of B films in air can limit their practical applications. Here, we study the evolution of the elemental composition, thickness, and morphology of 10–100-nm-thick amorphous B films sputter-deposited onto glassy carbon substrates and stored under different conditions. Results show that films with thicknesses of ≳55 nm have expected excellent corrosion resistance during storage in laboratory air at room temperature over several months. In contrast, ≲45-nm-thick films exhibit pronounced degradation upon air exposure, starting with a change in the composition to ∼30 and ∼50 at.% of O and H, respectively. After such an O and H uptake, the degradation proceeds via mass loss with a characteristic time constant of ∼5 days in air at room temperature. A post-deposition annealing at 1000 °C in an inert atmosphere makes all the films corrosion resistant.

Original language	English
Pages (from-to)	498-501
Number of pages	4
Journal	Applied Surface Science
Volume	448
DOIs	https://doi.org/10.1016/j.apsusc.2018.04.126
State	Published - 1 Aug 2018
Externally published	Yes

Keywords

AFM
Boron
Oxidation
Rutherford backscattering spectroscopy
Thin films

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10.1016/j.apsusc.2018.04.126

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title = "Degradation of ultra-thin boron films in air",

abstract = "Corrosion of B films in air can limit their practical applications. Here, we study the evolution of the elemental composition, thickness, and morphology of 10–100-nm-thick amorphous B films sputter-deposited onto glassy carbon substrates and stored under different conditions. Results show that films with thicknesses of ≳55 nm have expected excellent corrosion resistance during storage in laboratory air at room temperature over several months. In contrast, ≲45-nm-thick films exhibit pronounced degradation upon air exposure, starting with a change in the composition to ∼30 and ∼50 at.% of O and H, respectively. After such an O and H uptake, the degradation proceeds via mass loss with a characteristic time constant of ∼5 days in air at room temperature. A post-deposition annealing at 1000 °C in an inert atmosphere makes all the films corrosion resistant.",

keywords = "AFM, Boron, Oxidation, Rutherford backscattering spectroscopy, Thin films",

author = "{Bayu Aji}, {L. B.} and Baker, {A. A.} and Bae, {J. H.} and Hiszpanski, {A. M.} and E. Stavrou and McCall, {S. K.} and Kucheyev, {S. O.}",

note = "Publisher Copyright: {\textcopyright} 2018 Elsevier B.V.",

year = "2018",

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doi = "10.1016/j.apsusc.2018.04.126",

language = "英语",

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TY - JOUR

T1 - Degradation of ultra-thin boron films in air

AU - Bayu Aji, L. B.

AU - Baker, A. A.

AU - Bae, J. H.

AU - Hiszpanski, A. M.

AU - Stavrou, E.

AU - McCall, S. K.

AU - Kucheyev, S. O.

PY - 2018/8/1

Y1 - 2018/8/1

N2 - Corrosion of B films in air can limit their practical applications. Here, we study the evolution of the elemental composition, thickness, and morphology of 10–100-nm-thick amorphous B films sputter-deposited onto glassy carbon substrates and stored under different conditions. Results show that films with thicknesses of ≳55 nm have expected excellent corrosion resistance during storage in laboratory air at room temperature over several months. In contrast, ≲45-nm-thick films exhibit pronounced degradation upon air exposure, starting with a change in the composition to ∼30 and ∼50 at.% of O and H, respectively. After such an O and H uptake, the degradation proceeds via mass loss with a characteristic time constant of ∼5 days in air at room temperature. A post-deposition annealing at 1000 °C in an inert atmosphere makes all the films corrosion resistant.

AB - Corrosion of B films in air can limit their practical applications. Here, we study the evolution of the elemental composition, thickness, and morphology of 10–100-nm-thick amorphous B films sputter-deposited onto glassy carbon substrates and stored under different conditions. Results show that films with thicknesses of ≳55 nm have expected excellent corrosion resistance during storage in laboratory air at room temperature over several months. In contrast, ≲45-nm-thick films exhibit pronounced degradation upon air exposure, starting with a change in the composition to ∼30 and ∼50 at.% of O and H, respectively. After such an O and H uptake, the degradation proceeds via mass loss with a characteristic time constant of ∼5 days in air at room temperature. A post-deposition annealing at 1000 °C in an inert atmosphere makes all the films corrosion resistant.

KW - AFM

KW - Boron

KW - Oxidation

KW - Rutherford backscattering spectroscopy

KW - Thin films

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U2 - 10.1016/j.apsusc.2018.04.126

DO - 10.1016/j.apsusc.2018.04.126

M3 - 文章

AN - SCOPUS:85045753268

SN - 0169-4332

VL - 448

SP - 498

EP - 501

JO - Applied Surface Science

JF - Applied Surface Science

ER -

Degradation of ultra-thin boron films in air

Abstract

Keywords

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