Chemical Vapor Deposition of Tin for Sub-0.5 μm ULSI Circuits

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@article{0e51c09688b64378992c33a2b282bf98,

title = "Chemical Vapor Deposition of Tin for Sub-0.5 μm ULSI Circuits",

author = "M. Eizenberg",

year = "1995",

month = nov,

doi = "10.1557/S0883769400045541",

language = "英语",

volume = "20",

pages = "38--41",

journal = "MRS Bulletin",

issn = "0883-7694",

publisher = "Cambridge University Press",

number = "11",

}

TY - JOUR

T1 - Chemical Vapor Deposition of Tin for Sub-0.5 μm ULSI Circuits

AU - Eizenberg, M.

PY - 1995/11

Y1 - 1995/11

UR - http://www.scopus.com/inward/record.url?scp=0029403504&partnerID=8YFLogxK

U2 - 10.1557/S0883769400045541

DO - 10.1557/S0883769400045541

M3 - 文章

AN - SCOPUS:0029403504

SN - 0883-7694

VL - 20

SP - 38

EP - 41

JO - MRS Bulletin

JF - MRS Bulletin

IS - 11

ER -