Chemical vapor deposited TiCN: A new barrier metallization for submicron via and contact applications

M. Eizenberg, S. Ghanavem, M. Liao, R. Mosely, A. K. Sinha

Research output: Contribution to journalArticlepeer-review

63 Scopus citations

Fingerprint

Dive into the research topics of 'Chemical vapor deposited TiCN: A new barrier metallization for submicron via and contact applications'. Together they form a unique fingerprint.

Engineering & Materials Science

Physics & Astronomy

Chemical Compounds