Zero temperature coefficient of resistance in back-end-of-the-line compatible titanium aluminum nitride films by atomic layer deposition

Igor Krylov*, Yuanshen Qi, Valentina Korchnoy, Kamira Weinfeld, Moshe Eizenberg, Eilam Yalon

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

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Physics & Astronomy