Synthesis-structure relations for reactive magnetron sputtered V2O5 films

N. Fateh*, G. A. Fontalvo, L. Cha, T. Klünsner, G. Hlawacek, C. Teichert, C. Mitterer

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

19 Scopus citations

Abstract

V2O5 films were grown onto MgO (100) substrates by reactive magnetron sputtering between 26 °C to 300 °C to establish a detailed synthesis-structure relation. The effect of deposition temperature on structural characteristics and surface morphology was characterized using X-ray diffraction, Raman spectroscopy, atomic force microscopy and scanning and transmission electron microscopy. Films prepared at room temperature are amorphous while those deposited above 80 °C exhibit a polycrystalline structure with the orthorhombic symmetry of the V2O5 phase.

Original languageEnglish
Pages (from-to)1551-1555
Number of pages5
JournalSurface and Coatings Technology
Volume202
Issue number8
DOIs
StatePublished - 15 Jan 2008
Externally publishedYes

Keywords

  • Atomic force microscopy (AFM)
  • Raman spectroscopy
  • Thin films
  • Transmission electron microscopy (TEM)
  • VO

Fingerprint Dive into the research topics of 'Synthesis-structure relations for reactive magnetron sputtered V<sub>2</sub>O<sub>5</sub> films'. Together they form a unique fingerprint.

Cite this