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Dive into the research topics of 'Resistivity reduction and chemical stabilization of organometallic chemical vapor deposited titanium nitride by nitrogen rf plasma'. Together they form a unique fingerprint.- Sort by
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M. Danek*, M. Liao, J. Tseng, K. Littau, D. Saigal, H. Zhang, R. Mosely, M. Eizenberg
Research output: Contribution to journal › Article › peer-review