Resistivity reduction and chemical stabilization of organometallic chemical vapor deposited titanium nitride by nitrogen rf plasma

M. Danek*, M. Liao, J. Tseng, K. Littau, D. Saigal, H. Zhang, R. Mosely, M. Eizenberg

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

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Physics & Astronomy