Progress Report on Atomic Layer Deposition Toward Hybrid Nanocomposite Electrodes for Next Generation Supercapacitors

Dayakar Gandla, Daniel Qi Tan*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

2 Scopus citations

Abstract

In present supercapacitors' research atomic layer deposition (ALD) has proven to be a better technique of choice since the controlled deposition and better conformal surface coating minimize the ion diffusion and charge transport path which result in a supercapacitor with optimized energy and power density, good cyclic stability, and rate capability. This progress report summarizes the recent advances in ALD toward fabrication and surface modification of advanced hybrid nanocomposite electrodes for supercapacitors using some selected examples. A particular emphasis is given to the key role of ALD parameters in influencing the electrochemical performance of hybrid nanocomposite. In addition, the authors point out the current challenges and the strategies for future fine utilization of this technique to achieve desired energy density and overall performance. The authors anticipate this report to provide some insights and motivations to design high performance next generation supercapacitors by manipulating the parameters of ALD when using various active materials.

Original languageEnglish
Article number1900678
JournalAdvanced Materials Interfaces
Volume6
Issue number16
DOIs
StatePublished - 2019

Keywords

  • asymmetric supercapacitor
  • atomic layer deposition
  • cyclic life
  • energy density
  • hybrid nanocomposite

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