Process optimization and related material properties of silicon films produced by laser-induced chemical vapour deposition from silane

S. Tamir; J. Zahavi; Y. Komem; M. Eizenberg

doi:10.1007/BF00352902

Process optimization and related material properties of silicon films produced by laser-induced chemical vapour deposition from silane

S. Tamir^*, J. Zahavi, Y. Komem, M. Eizenberg

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

5 Scopus citations

Abstract

Laser-induced chemical vapour deposition of silicon films on SiO₂/Si (100) and Si (100) substrates was studied using ArF laser irradiation of silane/argon gas mixture in parallel to the substrate. The optimal deposition conditions were specified by examination of film morphology at a wide range of irradiation and process parameters. At optimal conditions, specular films were obtained with no powder formation. The effect of deposition parameters, such as laser energy and repetition rate, on the deposition rate and the related film quality, was investigated.

Original language	English
Pages (from-to)	1013-1019
Number of pages	7
Journal	Journal of Materials Science
Volume	31
Issue number	4
DOIs	https://doi.org/10.1007/BF00352902
State	Published - 1996
Externally published	Yes

Access to Document

10.1007/BF00352902

Cite this

@article{28b545ee1515435a989b09567cd9af42,

title = "Process optimization and related material properties of silicon films produced by laser-induced chemical vapour deposition from silane",

abstract = "Laser-induced chemical vapour deposition of silicon films on SiO2/Si (100) and Si (100) substrates was studied using ArF laser irradiation of silane/argon gas mixture in parallel to the substrate. The optimal deposition conditions were specified by examination of film morphology at a wide range of irradiation and process parameters. At optimal conditions, specular films were obtained with no powder formation. The effect of deposition parameters, such as laser energy and repetition rate, on the deposition rate and the related film quality, was investigated.",

author = "S. Tamir and J. Zahavi and Y. Komem and M. Eizenberg",

year = "1996",

doi = "10.1007/BF00352902",

language = "英语",

volume = "31",

pages = "1013--1019",

journal = "Journal of Materials Science",

issn = "0022-2461",

publisher = "Springer Netherlands",

number = "4",

}

TY - JOUR

T1 - Process optimization and related material properties of silicon films produced by laser-induced chemical vapour deposition from silane

AU - Tamir, S.

AU - Zahavi, J.

AU - Komem, Y.

AU - Eizenberg, M.

PY - 1996

Y1 - 1996

N2 - Laser-induced chemical vapour deposition of silicon films on SiO2/Si (100) and Si (100) substrates was studied using ArF laser irradiation of silane/argon gas mixture in parallel to the substrate. The optimal deposition conditions were specified by examination of film morphology at a wide range of irradiation and process parameters. At optimal conditions, specular films were obtained with no powder formation. The effect of deposition parameters, such as laser energy and repetition rate, on the deposition rate and the related film quality, was investigated.

AB - Laser-induced chemical vapour deposition of silicon films on SiO2/Si (100) and Si (100) substrates was studied using ArF laser irradiation of silane/argon gas mixture in parallel to the substrate. The optimal deposition conditions were specified by examination of film morphology at a wide range of irradiation and process parameters. At optimal conditions, specular films were obtained with no powder formation. The effect of deposition parameters, such as laser energy and repetition rate, on the deposition rate and the related film quality, was investigated.

UR - http://www.scopus.com/inward/record.url?scp=0030082282&partnerID=8YFLogxK

U2 - 10.1007/BF00352902

DO - 10.1007/BF00352902

M3 - 文章

AN - SCOPUS:0030082282

SN - 0022-2461

VL - 31

SP - 1013

EP - 1019

JO - Journal of Materials Science

JF - Journal of Materials Science

IS - 4

ER -

Process optimization and related material properties of silicon films produced by laser-induced chemical vapour deposition from silane

Abstract

Access to Document

Other files and links

Fingerprint

Cite this