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Obtaining low resistivity (∼100 μ Ω cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
Igor Krylov, Ekaterina Zoubenko, Kamira Weinfeld, Yaron Kauffmann, Xianbin Xu, Dan Ritter, Moshe Eizenberg
Research output: Contribution to journal › Article › peer-review
22
Scopus
citations