Novel 0.25 μm via plug process using low temperature CVD Al/TiN

G. A. Dixit*, Ajit Paranjpe, Qi Zhong Hong, L. M. Ting, J. D. Luttmer, R. H. Havemann, Drew Paul, Al Morrison, Karl Littau, M. Eizenberg, A. K. Sinha

*Corresponding author for this work

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