Investigation of the band offsets caused by thin Al 2O 3 layers in HfO 2 based Si metal oxide semiconductor devices

Lior Kornblum*, Boris Meyler, Catherine Cytermann, Svetlana Yofis, Joseph Salzman, Moshe Eizenberg

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

18 Scopus citations

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Physics & Astronomy