Abstract
Interfacial reactions in annealed Ni90Ti10 alloy thin films deposited on Si(100) were studied. The investigation was carried out by Auger electron spectroscopy, x-ray diffraction, and transmission electron microscopy combined with energy dispersive x-ray spectroscopy. Well defined phase separation was observed in the reaction zone. The first layer, adjacent to the Si substrate, contains Ni suicide, the second layer is most probably composed of the ternary Ni-Ti-Si compound.
Original language | English |
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Pages (from-to) | 1179-1181 |
Number of pages | 3 |
Journal | Journal of Applied Physics |
Volume | 79 |
Issue number | 2 |
DOIs | |
State | Published - 15 Jan 1996 |
Externally published | Yes |