Interaction between Ni90Ti10 alloy thin film and Si single crystal

M. Levit*, I. Grimberg, B. Z. Weiss, M. Eizenberg

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

4 Scopus citations

Abstract

Interfacial reactions in annealed Ni90Ti10 alloy thin films deposited on Si(100) were studied. The investigation was carried out by Auger electron spectroscopy, x-ray diffraction, and transmission electron microscopy combined with energy dispersive x-ray spectroscopy. Well defined phase separation was observed in the reaction zone. The first layer, adjacent to the Si substrate, contains Ni suicide, the second layer is most probably composed of the ternary Ni-Ti-Si compound.

Original languageEnglish
Pages (from-to)1179-1181
Number of pages3
JournalJournal of Applied Physics
Volume79
Issue number2
DOIs
StatePublished - 15 Jan 1996
Externally publishedYes

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