Intensity distribution of the eight-beam case of the Si-888 reflection in backscattering geometry

Stefan Haubold*, Klaus Dieter Liss, Rainer Hock, Andreas Magerl, Maren Lorenzen, Michael Krisch

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

2 Scopus citations

Abstract

The eight-beam case of the Si-888 reflection in backscattering has been studied by scanning the eight simultaneously excited reflections Si 888, Si 088, Si 880, Si 808, Si 800, Si 080, Si 008 and Si 000 in wavelength and two independent rocking angles. Largely different widths of the individual reflection profiles found are explained from the Ewald representation as suggested by kinematic diffraction theory. The intensity profiles demonstrate a coupling of the eight simultaneously excited wave fields as expected from dynamic diffraction theory.

Original languageEnglish
Pages (from-to)81-87
Number of pages7
JournalZeitschfrift fur Kristallographie
Volume219
Issue number2
DOIs
StatePublished - 2004
Externally publishedYes

Keywords

  • Backscattering
  • Dynamical diffraction
  • Eight beam case
  • Multi beam diffraction
  • X-ray diffraction

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