Impact of chemical bonding difference of ALD Mo on SiO2and Al2O3on the effective work function of the two gate stacks
Ekaterina Zoubenko*, Sara Iacopetti, Kamira Weinfeld, Yaron Kauffmann, Patrick Van Cleemput, Moshe Eizenberg
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review
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