Impact of chemical bonding difference of ALD Mo on SiO2and Al2O3on the effective work function of the two gate stacks

Ekaterina Zoubenko*, Sara Iacopetti, Kamira Weinfeld, Yaron Kauffmann, Patrick Van Cleemput, Moshe Eizenberg

*Corresponding author for this work

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Engineering & Materials Science

Chemical Compounds

Physics & Astronomy