Formation of barrier-type anodic films on sputtering-deposited Al-Ti alloys

V. C. Nettikaden, A. Baron-Wiecheć, P. Bailey, T. C.Q. Noakes, P. Skeldon*, G. E. Thompson

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

11 Scopus citations


The formation of amorphous anodic films at constant current is investigated for sputtering-deposited Al-Ti alloys containing from 3-30at.% Ti. The films were grown at high efficiency in a borate electrolyte and comprised a main region containing units of Al2O3 and TiO2, with a thin surface region enriched in titanium species. The formation ratios of the films increased with increase of titanium content of the alloys. The presence of the outer region is explained by the faster migration of Ti4+ ions relative to that of Al3+ ions through the films.

Original languageEnglish
Pages (from-to)3717-3724
Number of pages8
JournalCorrosion Science
Issue number11
StatePublished - Nov 2010
Externally publishedYes


  • A. Titanium
  • A: Aluminium
  • B. RBS
  • B: TEM
  • C: Anodic films


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