Factors which determine the orientation of CVD Al films grown on TiN

Engineering & Materials Science

• Physical vapor deposition 100%
• Chemical vapor deposition 94%
• Electromigration 52%
• Thick films 49%
• Microscopic examination 43%
• Nucleation 42%
• X ray diffraction 39%
• Aspect ratio 37%
• Textures 32%

Physics & Astronomy

• linings 88%
• vapor deposition 62%
• electromigration 47%
• high aspect ratio 43%
• thick films 38%
• textures 33%
• nucleation 30%
• microscopy 28%
• electrical resistivity 25%
• diffraction 21%
• x rays 18%

Chemical Compounds

• Liquid Film 39%
• Crystalline Texture 26%
• Nucleation 22%
• X-Ray Diffraction 13%