Facile patterning silicon wafer by Rochow reaction over patterned Cu-based catalysts

Wenfeng Ren; Yanhong Wang; Zailei Zhang; Qiangqiang Tan; Ziyi Zhong; Fabing Su

doi:10.1016/j.apsusc.2015.10.233

Facile patterning silicon wafer by Rochow reaction over patterned Cu-based catalysts

Wenfeng Ren, Yanhong Wang^*, Zailei Zhang, Qiangqiang Tan, Ziyi Zhong, Fabing Su

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

3 Scopus citations

Abstract

Despite the promising application of patterned Si wafers (PSWs) in electrochemistry and photochemistry, the simple and environment-friendly fabrication of these PSWs is still a great challenge. Herein, we report a novel method for fabrication of PSWs via Rochow reaction, which is commonly used to produce organosilane monomers for synthesizing organosilane products in chemical industry. In this reaction, commercial Si wafers (SWs) reacted with gas CH ₃ Cl over patterned various Cu-based catalyst to create regular patterns. PSWs were obtained after removal of Cu compounds followed with facile post treatment. Because of simplicity, low-cost and low-toxicity of this approach, the manufacture of PSWs on an industrial scale is highly possible, which can be realized by integrating the organosilane synthesis process and controlling the reaction conditions.

Original language	English
Pages (from-to)	192-197
Number of pages	6
Journal	Applied Surface Science
Volume	360
DOIs	https://doi.org/10.1016/j.apsusc.2015.10.233
State	Published - 1 Jan 2016
Externally published	Yes

Keywords

CH Cl
Copper catalysts
Direct-pattern
Rochow reaction
Si wafers

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10.1016/j.apsusc.2015.10.233

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title = "Facile patterning silicon wafer by Rochow reaction over patterned Cu-based catalysts",

abstract = " Despite the promising application of patterned Si wafers (PSWs) in electrochemistry and photochemistry, the simple and environment-friendly fabrication of these PSWs is still a great challenge. Herein, we report a novel method for fabrication of PSWs via Rochow reaction, which is commonly used to produce organosilane monomers for synthesizing organosilane products in chemical industry. In this reaction, commercial Si wafers (SWs) reacted with gas CH 3 Cl over patterned various Cu-based catalyst to create regular patterns. PSWs were obtained after removal of Cu compounds followed with facile post treatment. Because of simplicity, low-cost and low-toxicity of this approach, the manufacture of PSWs on an industrial scale is highly possible, which can be realized by integrating the organosilane synthesis process and controlling the reaction conditions.",

keywords = "CH Cl, Copper catalysts, Direct-pattern, Rochow reaction, Si wafers",

author = "Wenfeng Ren and Yanhong Wang and Zailei Zhang and Qiangqiang Tan and Ziyi Zhong and Fabing Su",

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doi = "10.1016/j.apsusc.2015.10.233",

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T1 - Facile patterning silicon wafer by Rochow reaction over patterned Cu-based catalysts

AU - Ren, Wenfeng

AU - Wang, Yanhong

AU - Zhang, Zailei

AU - Tan, Qiangqiang

AU - Zhong, Ziyi

AU - Su, Fabing

PY - 2016/1/1

Y1 - 2016/1/1

N2 - Despite the promising application of patterned Si wafers (PSWs) in electrochemistry and photochemistry, the simple and environment-friendly fabrication of these PSWs is still a great challenge. Herein, we report a novel method for fabrication of PSWs via Rochow reaction, which is commonly used to produce organosilane monomers for synthesizing organosilane products in chemical industry. In this reaction, commercial Si wafers (SWs) reacted with gas CH 3 Cl over patterned various Cu-based catalyst to create regular patterns. PSWs were obtained after removal of Cu compounds followed with facile post treatment. Because of simplicity, low-cost and low-toxicity of this approach, the manufacture of PSWs on an industrial scale is highly possible, which can be realized by integrating the organosilane synthesis process and controlling the reaction conditions.

AB - Despite the promising application of patterned Si wafers (PSWs) in electrochemistry and photochemistry, the simple and environment-friendly fabrication of these PSWs is still a great challenge. Herein, we report a novel method for fabrication of PSWs via Rochow reaction, which is commonly used to produce organosilane monomers for synthesizing organosilane products in chemical industry. In this reaction, commercial Si wafers (SWs) reacted with gas CH 3 Cl over patterned various Cu-based catalyst to create regular patterns. PSWs were obtained after removal of Cu compounds followed with facile post treatment. Because of simplicity, low-cost and low-toxicity of this approach, the manufacture of PSWs on an industrial scale is highly possible, which can be realized by integrating the organosilane synthesis process and controlling the reaction conditions.

KW - CH Cl

KW - Copper catalysts

KW - Direct-pattern

KW - Rochow reaction

KW - Si wafers

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U2 - 10.1016/j.apsusc.2015.10.233

DO - 10.1016/j.apsusc.2015.10.233

M3 - 文章

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SN - 0169-4332

VL - 360

SP - 192

EP - 197

JO - Applied Surface Science

JF - Applied Surface Science

ER -

Facile patterning silicon wafer by Rochow reaction over patterned Cu-based catalysts

Abstract

Keywords

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