Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition

Igor Krylov; Xianbin Xu; Yuanshen Qi; Kamira Weinfeld; Valentina Korchnoy; Moshe Eizenberg; Dan Ritter

doi:10.1116/1.5109717

Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition

Igor Krylov, Xianbin Xu, Yuanshen Qi, Kamira Weinfeld, Valentina Korchnoy, Moshe Eizenberg, Dan Ritter

Research output: Contribution to journal › Article › peer-review

17 Scopus citations

Abstract

The authors deposited titanium nitride (TiN) films by plasma-enhanced atomic layer deposition on various types of amorphous, polycrystalline, and single crystalline substrates and found that the crystallinity of the substrate strongly affects the morphology, orientation, and resistivity of the films. An appropriate substrate choice yields TiN films with bulk resistivity values of about ∼20 μω cm. The preferred crystallographic orientation of the films, either (111) or (001), does not affect film resistivity.

Original language	English
Article number	060905
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	37
Issue number	6
DOIs	https://doi.org/10.1116/1.5109717
State	Published - 1 Dec 2019
Externally published	Yes

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abstract = "The authors deposited titanium nitride (TiN) films by plasma-enhanced atomic layer deposition on various types of amorphous, polycrystalline, and single crystalline substrates and found that the crystallinity of the substrate strongly affects the morphology, orientation, and resistivity of the films. An appropriate substrate choice yields TiN films with bulk resistivity values of about ∼20 μω cm. The preferred crystallographic orientation of the films, either (111) or (001), does not affect film resistivity.",

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T1 - Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition

AU - Krylov, Igor

AU - Xu, Xianbin

AU - Qi, Yuanshen

AU - Weinfeld, Kamira

AU - Korchnoy, Valentina

AU - Eizenberg, Moshe

AU - Ritter, Dan

PY - 2019/12/1

Y1 - 2019/12/1

N2 - The authors deposited titanium nitride (TiN) films by plasma-enhanced atomic layer deposition on various types of amorphous, polycrystalline, and single crystalline substrates and found that the crystallinity of the substrate strongly affects the morphology, orientation, and resistivity of the films. An appropriate substrate choice yields TiN films with bulk resistivity values of about ∼20 μω cm. The preferred crystallographic orientation of the films, either (111) or (001), does not affect film resistivity.

AB - The authors deposited titanium nitride (TiN) films by plasma-enhanced atomic layer deposition on various types of amorphous, polycrystalline, and single crystalline substrates and found that the crystallinity of the substrate strongly affects the morphology, orientation, and resistivity of the films. An appropriate substrate choice yields TiN films with bulk resistivity values of about ∼20 μω cm. The preferred crystallographic orientation of the films, either (111) or (001), does not affect film resistivity.

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U2 - 10.1116/1.5109717

DO - 10.1116/1.5109717

M3 - 文章

AN - SCOPUS:85072768194

SN - 0734-2101

VL - 37

JO - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

JF - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

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M1 - 060905

ER -

Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition

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