Directing self-assembly of nanostructures kinetically: Patterning and the Ehrlich-Schwoebel barrier

Chuan Fu Lin*, Ajmi B.H. Hammouda, Hung Chih Kan, N. C. Bartelt, R. J. Phaneuf

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

7 Scopus citations

Abstract

We present the results of kinetic Monte Carlo simulations of homoepitaxial growth on a patterned substrate in the presence of an extra barrier to a diffusing adatom crossing of steps from above (Ehrlich-Schwoebel barrier) on topographically patterned surfaces. Our results indicate that over a wide range of Ehrlich-Schwoebel barrier heights, incident atom fluxes, and temperatures that multilayer islands or "growth mounds" grow in arrangements which are directed by the topographical pattern. Our simulations indicate that a series of arrangements should form as the temperature is changed due to a competition between the temperature-dependent mound size and the pattern period. We compare these predictions with experimental observation of directed mound assembly on nanopatterned GaAs(001).

Original languageEnglish
Article number085421
JournalPhysical Review B - Condensed Matter and Materials Physics
Volume85
Issue number8
DOIs
StatePublished - 13 Feb 2012
Externally publishedYes

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