Copper-related degradation of SiO2 in metal-oxide-semiconductor capacitors subjected to bias thermal stress: Leakage of the minority charge carriers in the inversion layer

A. Kohn*, E. Lipp, M. Eizenberg, Y. Shacham-Diamand

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

7 Scopus citations

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Physics & Astronomy