Chemical bonding and nanomolecular length effects on work function at Au-organophosphonate-HfO2 interfaces

Roy Winter; Matthew Kwan; P. Hubert Mutin; Ganpati Ramanath; Moshe Eizenberg

doi:10.1063/1.4981773

Chemical bonding and nanomolecular length effects on work function at Au-organophosphonate-HfO₂ interfaces

Roy Winter, Matthew Kwan, P. Hubert Mutin, Ganpati Ramanath^*, Moshe Eizenberg

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

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Abstract

We demonstrate that introducing a thiol-terminated organophosphonate nanomolecular layer (NML) can increase the effective work function at Au-HfO₂ interfaces by up to ΔΦ_eff = 0.55 ± 0.05 eV. Capacitance measurements of Au-NML-HfO₂-SiO₂-Si stacks and ultraviolet photoelectron spectroscopy of Au-NML-HfO₂ structures, and parts thereof, reveal that Φ_eff shifts are primarily determined by the length of the molecules comprising the NML, while Au-NML and NML-oxide bonding dipole contributions tend to counteract each other. Our findings provide insights into tailoring the electronic properties of metal-oxide heterointerfaces for applications by harmonizing the effects of interfacial bonding and NML morphology.

Original language	English
Article number	181604
Journal	Applied Physics Letters
Volume	110
Issue number	18
DOIs	https://doi.org/10.1063/1.4981773
State	Published - 1 May 2017
Externally published	Yes

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abstract = "We demonstrate that introducing a thiol-terminated organophosphonate nanomolecular layer (NML) can increase the effective work function at Au-HfO2 interfaces by up to ΔΦeff = 0.55 ± 0.05 eV. Capacitance measurements of Au-NML-HfO2-SiO2-Si stacks and ultraviolet photoelectron spectroscopy of Au-NML-HfO2 structures, and parts thereof, reveal that Φeff shifts are primarily determined by the length of the molecules comprising the NML, while Au-NML and NML-oxide bonding dipole contributions tend to counteract each other. Our findings provide insights into tailoring the electronic properties of metal-oxide heterointerfaces for applications by harmonizing the effects of interfacial bonding and NML morphology.",

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AU - Winter, Roy

AU - Kwan, Matthew

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AU - Ramanath, Ganpati

AU - Eizenberg, Moshe

PY - 2017/5/1

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N2 - We demonstrate that introducing a thiol-terminated organophosphonate nanomolecular layer (NML) can increase the effective work function at Au-HfO2 interfaces by up to ΔΦeff = 0.55 ± 0.05 eV. Capacitance measurements of Au-NML-HfO2-SiO2-Si stacks and ultraviolet photoelectron spectroscopy of Au-NML-HfO2 structures, and parts thereof, reveal that Φeff shifts are primarily determined by the length of the molecules comprising the NML, while Au-NML and NML-oxide bonding dipole contributions tend to counteract each other. Our findings provide insights into tailoring the electronic properties of metal-oxide heterointerfaces for applications by harmonizing the effects of interfacial bonding and NML morphology.

AB - We demonstrate that introducing a thiol-terminated organophosphonate nanomolecular layer (NML) can increase the effective work function at Au-HfO2 interfaces by up to ΔΦeff = 0.55 ± 0.05 eV. Capacitance measurements of Au-NML-HfO2-SiO2-Si stacks and ultraviolet photoelectron spectroscopy of Au-NML-HfO2 structures, and parts thereof, reveal that Φeff shifts are primarily determined by the length of the molecules comprising the NML, while Au-NML and NML-oxide bonding dipole contributions tend to counteract each other. Our findings provide insights into tailoring the electronic properties of metal-oxide heterointerfaces for applications by harmonizing the effects of interfacial bonding and NML morphology.

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Chemical bonding and nanomolecular length effects on work function at Au-organophosphonate-HfO₂ interfaces

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