Atomic layer deposition of tungsten film from WF6/B2H6: Nucleation layer for advanced semiconductor devices

Michael Yang*, Hua Chung, Alex Yoon, Hongbin Fang, Amy Zhang, Cheryl Knepfler, Robert Jackson, Jeong Soo Byun, Alfred Mak, Moshe Eizenberg, Ming Xi, Moris Kori, A. K. Sinha

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

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Engineering & Materials Science

Chemical Compounds