Atomic Layer Deposition (ALD) of Alumina over Activated Carbon Electrodes Enabling a Stable 4 V Supercapacitor Operation

Dayakar Gandla, Guanghui Song, Chongrui Wu, Yair Ein-Eli, Daniel Q. Tan*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

1 Scopus citations

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