A phenomenological approach to the deposition pattern of evaporating droplets with contact line pinning

Haiqin Wang; Dadong Yan; Tiezheng Qian

doi:10.1088/1361-648X/aae1dc

A phenomenological approach to the deposition pattern of evaporating droplets with contact line pinning

Haiqin Wang^*, Dadong Yan, Tiezheng Qian

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

3 Scopus citations

Abstract

When an evaporating droplet of colloidal suspension dries on a solid surface with the contact line pinned, the solute particles are driven by the solvent flow toward the edge and form a ring-like deposition pattern. In this work, we take into account the contact angle hysteresis and incorporate it into the effective model of Man and Doi (2016 Phys. Rev. Lett. 116 066101) which is based on Onsager's variational principle. We show that single-ring pattern is formed when the contact line pinning and/or friction are sufficiently strong. We demonstrate that there exists an appropriate range for contact line pinning and friction in which two rings can be formed in the deposition pattern, one at the initially pinned contact line and the other a bit closer to the center of droplet.

Original language	English
Article number	435001
Journal	Journal of Physics Condensed Matter
Volume	30
Issue number	43
DOIs	https://doi.org/10.1088/1361-648X/aae1dc
State	Published - 3 Oct 2018
Externally published	Yes

Keywords

colloidal suspension
deposition pattern
evaporating droplet
moving contact line
pinning and depinning

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10.1088/1361-648X/aae1dc

Cite this

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title = "A phenomenological approach to the deposition pattern of evaporating droplets with contact line pinning",

abstract = "When an evaporating droplet of colloidal suspension dries on a solid surface with the contact line pinned, the solute particles are driven by the solvent flow toward the edge and form a ring-like deposition pattern. In this work, we take into account the contact angle hysteresis and incorporate it into the effective model of Man and Doi (2016 Phys. Rev. Lett. 116 066101) which is based on Onsager's variational principle. We show that single-ring pattern is formed when the contact line pinning and/or friction are sufficiently strong. We demonstrate that there exists an appropriate range for contact line pinning and friction in which two rings can be formed in the deposition pattern, one at the initially pinned contact line and the other a bit closer to the center of droplet.",

keywords = "colloidal suspension, deposition pattern, evaporating droplet, moving contact line, pinning and depinning",

author = "Haiqin Wang and Dadong Yan and Tiezheng Qian",

note = "Publisher Copyright: {\textcopyright} 2018 IOP Publishing Ltd.",

year = "2018",

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doi = "10.1088/1361-648X/aae1dc",

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TY - JOUR

T1 - A phenomenological approach to the deposition pattern of evaporating droplets with contact line pinning

AU - Wang, Haiqin

AU - Yan, Dadong

AU - Qian, Tiezheng

PY - 2018/10/3

Y1 - 2018/10/3

N2 - When an evaporating droplet of colloidal suspension dries on a solid surface with the contact line pinned, the solute particles are driven by the solvent flow toward the edge and form a ring-like deposition pattern. In this work, we take into account the contact angle hysteresis and incorporate it into the effective model of Man and Doi (2016 Phys. Rev. Lett. 116 066101) which is based on Onsager's variational principle. We show that single-ring pattern is formed when the contact line pinning and/or friction are sufficiently strong. We demonstrate that there exists an appropriate range for contact line pinning and friction in which two rings can be formed in the deposition pattern, one at the initially pinned contact line and the other a bit closer to the center of droplet.

AB - When an evaporating droplet of colloidal suspension dries on a solid surface with the contact line pinned, the solute particles are driven by the solvent flow toward the edge and form a ring-like deposition pattern. In this work, we take into account the contact angle hysteresis and incorporate it into the effective model of Man and Doi (2016 Phys. Rev. Lett. 116 066101) which is based on Onsager's variational principle. We show that single-ring pattern is formed when the contact line pinning and/or friction are sufficiently strong. We demonstrate that there exists an appropriate range for contact line pinning and friction in which two rings can be formed in the deposition pattern, one at the initially pinned contact line and the other a bit closer to the center of droplet.

KW - colloidal suspension

KW - deposition pattern

KW - evaporating droplet

KW - moving contact line

KW - pinning and depinning

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U2 - 10.1088/1361-648X/aae1dc

DO - 10.1088/1361-648X/aae1dc

M3 - 文章

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AN - SCOPUS:85054666028

SN - 0953-8984

VL - 30

JO - Journal of Physics Condensed Matter

JF - Journal of Physics Condensed Matter

IS - 43

M1 - 435001

ER -

A phenomenological approach to the deposition pattern of evaporating droplets with contact line pinning

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