Self-formation of polymer nanostructures in plasma etching: Mechanisms and applications

TY - JOUR

T1 - Self-formation of polymer nanostructures in plasma etching

T2 - Mechanisms and applications

AU - Du, Ke

AU - Jiang, Youhua

AU - Huang, Po Shun

AU - Ding, Junjun

AU - Gao, Tongchuan

AU - Choi, Chang Hwan

N1 - Publisher Copyright: © 2017 IOP Publishing Ltd.

PY - 2018/1

Y1 - 2018/1

N2 - In recent years, plasma-induced self-formation of polymer nanostructures has emerged as a simple, scalable and rapid nanomanufacturing technique to pattern sub-100 nm nanostructures. High-aspect-ratio nanostructures (>20:1) are fabricated on a variety of polymer surfaces such as poly(methylmethacrylate) (PMMA), polystyrene (PS), polydimethylsiloxane (PDMS), and fluorinated ethylene propylene (FEP). Sub-100 nm nanostructures (i.e. diameter 50 nm) are fabricated in this one-step process without relying on slow and expensive nanolithography techniques. This review starts with discussion of the self-formation mechanisms including surface modulation, random masks, and materials impurities. Emphasis is put on the applications of polymer nanostructures in the fields of hierarchical nanostructures, liquid repellence, adhesion, lab-on-a-chip, surface enhanced Raman scattering (SERS), organic light emitting diode (OLED), and energy harvesting. The unique advantages of this nanomanufacturing technique are illustrated, followed by prospects.

AB - In recent years, plasma-induced self-formation of polymer nanostructures has emerged as a simple, scalable and rapid nanomanufacturing technique to pattern sub-100 nm nanostructures. High-aspect-ratio nanostructures (>20:1) are fabricated on a variety of polymer surfaces such as poly(methylmethacrylate) (PMMA), polystyrene (PS), polydimethylsiloxane (PDMS), and fluorinated ethylene propylene (FEP). Sub-100 nm nanostructures (i.e. diameter 50 nm) are fabricated in this one-step process without relying on slow and expensive nanolithography techniques. This review starts with discussion of the self-formation mechanisms including surface modulation, random masks, and materials impurities. Emphasis is put on the applications of polymer nanostructures in the fields of hierarchical nanostructures, liquid repellence, adhesion, lab-on-a-chip, surface enhanced Raman scattering (SERS), organic light emitting diode (OLED), and energy harvesting. The unique advantages of this nanomanufacturing technique are illustrated, followed by prospects.

KW - nanomanufacturing

KW - nanostructures

KW - plasma

UR - http://www.scopus.com/inward/record.url?scp=85038615322&partnerID=8YFLogxK

U2 - 10.1088/1361-6439/aa9d28

DO - 10.1088/1361-6439/aa9d28

M3 - 文献综述

AN - SCOPUS:85038615322

SN - 0960-1317

VL - 28

JO - Journal of Micromechanics and Microengineering

JF - Journal of Micromechanics and Microengineering

IS - 1

M1 - 014006

ER -