TY - JOUR
T1 - Assembly of tantalum porous films with graded oxidation profile from size-selected nanoparticles
AU - Singh, Vidyadhar
AU - Grammatikopoulos, Panagiotis
AU - Cassidy, Cathal
AU - Benelmekki, Maria
AU - Bohra, Murtaza
AU - Hawash, Zafer
AU - Baughman, Kenneth W.
AU - Sowwan, Mukhles
PY - 2014/5
Y1 - 2014/5
N2 - Functionally graded materials offer a way to improve the physical and chemical properties of thin films and coatings for different applications in the nanotechnology and biomedical fields. In this work, design and assembly of nanoporous tantalum films with a graded oxidation profile perpendicular to the substrate surface are reported. These nanoporous films are composed of size-selected, amorphous tantalum nanoparticles, deposited using a gas-aggregated magnetron sputtering system, and oxidized after coalescence, as samples evolve from mono- to multi-layered structures. Molecular dynamics computer simulations shed light on atomistic mechanisms of nanoparticle coalescence, which govern the films porosity. Aberration-corrected (S) TEM, GIXRD, AFM, SEM, and XPS were employed to study the morphology, phase and oxidation profiles of the tantalum nanoparticles, and the resultant films.
AB - Functionally graded materials offer a way to improve the physical and chemical properties of thin films and coatings for different applications in the nanotechnology and biomedical fields. In this work, design and assembly of nanoporous tantalum films with a graded oxidation profile perpendicular to the substrate surface are reported. These nanoporous films are composed of size-selected, amorphous tantalum nanoparticles, deposited using a gas-aggregated magnetron sputtering system, and oxidized after coalescence, as samples evolve from mono- to multi-layered structures. Molecular dynamics computer simulations shed light on atomistic mechanisms of nanoparticle coalescence, which govern the films porosity. Aberration-corrected (S) TEM, GIXRD, AFM, SEM, and XPS were employed to study the morphology, phase and oxidation profiles of the tantalum nanoparticles, and the resultant films.
KW - Coalescence
KW - Graded oxidation
KW - Nanoparticles
KW - Nanoporous film
KW - Tantalum
KW - XPS
UR - http://www.scopus.com/inward/record.url?scp=84897360886&partnerID=8YFLogxK
U2 - 10.1007/s11051-014-2373-7
DO - 10.1007/s11051-014-2373-7
M3 - 文章
AN - SCOPUS:84897360886
SN - 1388-0764
VL - 16
JO - Journal of Nanoparticle Research
JF - Journal of Nanoparticle Research
IS - 5
M1 - 2373
ER -